Low-reflective thin-film substrate

Stock material or miscellaneous articles – Composite – Of quartz or glass

Reexamination Certificate

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Details

C428S433000, C428S469000, C428S472000, C428S701000, C359S359000, C359S360000

Reexamination Certificate

active

07056587

ABSTRACT:
A low-reflective thin-film substrate comprising a transparent glass substrate having formed by sputtering a thin film in multilayer containing no chromium series component and made up of at least one kind of Ni, Fe, Co, Mo, W, Ta, Cu, and Nb as a main constituent form or as an alloy thereof, the thin film having a minimum reflectivity of 0.5% or lower and the optical density of at least 4 or having a minimum reflectivity of 0.1% or lower, a maximum reflectivity of 2.0% or lower, an average reflectivity of 0.3% or lower, and an optical density of at least 4.0, in the visible light region. The low-reflective thin-film substrate is useful as a black matrix for a color filter substrate of a liquid crystal panel, etc., and is free from an environmental pollution caused by the use of a chromium component as the target material.

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patent: 5083853 (1992-01-01), Ueki et al.
patent: 5142392 (1992-08-01), Ueki et al.
patent: 5714268 (1998-02-01), Anderson et al.
patent: 6445503 (2002-09-01), Lingle
patent: 01142712 (1989-06-01), None
patent: 06299354 (1994-10-01), None
patent: 07267681 (1995-10-01), None

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