Low reflection shadow mask

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

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Details

349111, 349105, 359585, 359589, G02F 11335

Patent

active

058087141

ABSTRACT:
A very low reflectance optical coating comprising alternating layers of materials such as chromium oxide and chromium, silicon oxide and silicon, titanium oxide and titanium, and tantalum oxide and tantalum is suitable for use as a black shadow mask in liquid crystal displays, among various applications. Certain designs such as silicon oxide/silicon benefit from a transmission-decreasing overcoat of material such as molybdenum, germanium or titanium.

REFERENCES:
patent: 3698928 (1972-10-01), Blome
patent: 3736047 (1973-05-01), Gelber et al.
patent: 4101200 (1978-07-01), Daxinger
patent: 4139443 (1979-02-01), Sakurai
patent: 4166148 (1979-08-01), Sakurai
patent: 4178403 (1979-12-01), Sakurai et al.
patent: 4363846 (1982-12-01), Kaneki
patent: 5039204 (1991-08-01), Choi
patent: 5155609 (1992-10-01), Konno et al.
patent: 5272554 (1993-12-01), Ji et al.
patent: 5282070 (1994-01-01), Nishida et al.
patent: 5367393 (1994-11-01), Ohara et al.
patent: 5566011 (1996-10-01), Steigerwald
patent: 5570212 (1996-10-01), Steigerwald

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