Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-07-25
1984-07-31
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
204192SP, 204192R, 428630, C23C 1500
Patent
active
044628846
ABSTRACT:
A method is disclosed for producing by cathode sputtering a silver/copper coated article which duplicates the low reflectance colored appearance of a silver/copper coated article produced by wet chemical deposition. The method involves depositing the silver layer in a discontinuous agglomerated state.
REFERENCES:
patent: 3457138 (1969-07-01), Miller
patent: 3904503 (1975-09-01), Hanfmann
patent: 3904506 (1975-09-01), Carmichael et al.
patent: 3925182 (1975-12-01), Carmichael et al.
patent: 4009090 (1977-02-01), Veigel
patent: 4166018 (1979-08-01), Chapin
Criss Russell C.
Gillery F. Howard
Demers Arthur P.
PPG Industries Inc.
Seidel Donna L.
LandOfFree
Low reflectance, low emissivity sputtered film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low reflectance, low emissivity sputtered film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low reflectance, low emissivity sputtered film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-184535