Low pressure plasma discharge formation of refractory coatings

Details Low pressure plasma discharge formation of refractory coatings Low pressure plasma discharge formation of refractory coatings

1982-07-26

1984-03-13

Lawrence, Evan K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427107, 427237, 427238, B05D 306

Patent

active

044367627

ABSTRACT:
A protective refractory metal oxide coating of 3Al.sub.2 O.sub.3.2SiO.sub.2 or 3B.sub.2 O.sub.3.2SiO.sub.2 is coated on the internal surface of a vessel by low pressure plasma induced chemical reactions. The source of the SiO.sub.2 required for the reaction can either be from the internal surface of the vessel (e.g., glass, quartz) or it can be introduced into the vessel.

REFERENCES:
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patent: 3043983 (1962-07-01), Ray
patent: 3377498 (1968-04-01), Koury et al.
patent: 3533827 (1970-10-01), Rimbach
patent: 3586898 (1971-06-01), Speros et al.
patent: 3619699 (1971-11-01), White
patent: 4048348 (1977-09-01), Bailey et al.
patent: 4265950 (1981-05-01), Graff
d'Agostino, R. and Flumm, D., Plasma Etching of Si and SiO.sub.2 in SF.sub.6 -O.sub.2 Mixtures, J. Appl. Phys. 52(1): pp. 162-167, Jan. 1981.

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