Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1986-05-15
1988-08-23
Newsome, John H.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 39, 437200, B05D 306, B05D 512
Patent
active
047660066
ABSTRACT:
The invention relates to a process for the low pressure chemical vapor deposition (LPCVD) of metal silicide, especially molybdenum silicide, on a substrate at a low temperature. The walls of a LPCVD reactor which contains a heated pedestal for holding a substrate are cooled and the pedestal is heated so the substrate temperature reaches a desired level, depending on the metal silicide to be deposited. A metal halide and a silane or disilane are fed separately into the deposition chamber and mixed behind a small baffle plate at the entrance. The metal silicide is deposited on the substrate surface. It is preferred that the substrate be pre-treated with H.sub.2 plasma before deposition.
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Cole Stanley Z.
Fisher Gerald M.
Newsome John H.
Padgett M. L.
Varian Associates Inc.
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