Low-polydispersity photoimageable polymers and photoresists...

Details Low-polydispersity photoimageable polymers and photoresists... Low-polydispersity photoimageable polymers and photoresists...

2004-09-20

2008-08-05

Choi, Ling-Sui (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S318000, C526S280000, C526S281000

Reexamination Certificate

active

07408013

ABSTRACT:
The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

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T.Y Lee et al., Advances in Resist Technology and Processing XX, Theodore H. Fedynyshyn, Editor, Proceedings of SPIE, vol. 5039:548-557, 2003.
Moad and Solomon, The Chemistry of Free Radical Polymerization, Pergamon, London, pp. 53-95:1995.

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