Low phosphorous, low etch cleaner and method

Details Low phosphorous, low etch cleaner and method Low phosphorous, low etch cleaner and method

1994-03-24

1995-12-05

Lieberman, Paul

Compositions

Compositions containing a single chemical reactant or plural...

Organic reactant

252 795, 25217416, 25217421, 25217424, 134 42, 216102, C11D 134, C11D 172, C11D 337

Patent

active

054726301

ABSTRACT:
Compositions and methods for cleaning and etching an aluminum surface with a low etch, low phosphate alkaline cleaner solution are disclosed. The preferred composition employs a stable combination of an alkali metal hydroxide, gluconic acid, a detergent source, an aluminum sequestrant, an oil emulsifier, a defoamer, and a hydrotrope.

REFERENCES:
patent: 4085060 (1978-04-01), Vassileff
patent: 4477290 (1984-10-01), Carroll et al.
patent: 4762638 (1988-08-01), Dollman et al.
patent: 5110494 (1992-05-01), Beck
patent: 5114607 (1992-05-01), Deck et al.
patent: 5200114 (1993-06-01), Beck
patent: 5342450 (1994-08-01), Cockrell, Jr. et al.

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