Low net stress multilayer thin film coatings

Optical: systems and elements – Light interference – Produced by coating or lamina

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359582, 359588, G02B 102, G02B 110, G02B 528

Patent

active

059300469

ABSTRACT:
It has been discovered that control of the intra-layer stress in layers of high refractive index materials, such as zirconia and titania, permits low net stress multilayer thin film stacks comprising alternating layers of the high refractive index material and silica, a low refractive index material, to be sputter-deposited on glass substrates. In particular, a simple, cost-effective and readily reproducible post-deposition annealing process is used, i.e., an annealing process that can be effected within a broad temperature range and for a brief and substantially open-ended time period, to change the post-deposition microstructure of the high refractive index film layers and create a selected intra-layer tensile stress. The intra-layer tensile stress created during such an annealing process is largely dependent on the post-deposition microstructure of the high refractive index thin film layers. It has been further discovered that the deposition conditions and, in particular, ion bombardment energy, can be controlled to provide a selected and reproducible post-deposition microstructure that is partially amorphous and partially crystalline and which transforms during annealing to a very dense crystalline microstructure. This transformation results in film shrinkage and, because the film is constrained by the glass substrate, the film shrinkage produces a selected amount of tensile stress that compensates for the compressive stress of the silica thin film layers.

REFERENCES:
patent: 4732454 (1988-03-01), Saito et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 5194989 (1993-03-01), Ferrante
patent: 5225057 (1993-07-01), LeFebvre et al.
patent: 5415756 (1995-05-01), Wolfe et al.
patent: 5424876 (1995-06-01), Fujii
patent: 5525199 (1996-06-01), Scobey
patent: 5618388 (1997-04-01), Seeser et al.
patent: 5646780 (1997-07-01), Crook et al.
patent: 5656138 (1997-08-01), Scobey et al.
patent: 5790304 (1998-08-01), Sanders et al.
Russak, M.A., Jahnes, C.V., "Reactive magnetron sputtered zirconian oxide and zirconium silicon oxide thin films," J. Vac. Sci. Technol. A 7 (3), May/Jun. 1989; 1248-1253.
Pond, B.J., DeBar, J.I., Carniglia, C.K., Raj, T., "Stress reduction in ion beam sputtered mixed oxide films," Applied Optics, vol. 28 (14), 1989; 2800-2804.
Sankur, H., Gunning, W., "Sorbed water and intrinsic stress in composite TiO.sub.2 -SiO.sub.2 films," J. Appl. Phys. 66 (2), 1989; 807-812.
Rujkorakam, Sites, J.R., "Crystallization of zirconia films by thermal annealing," J. Vac. Sci. Technol. A 4 (3), May/Jun. 1986; 568-571.
Yang, M.M., Reith, T.M., "Process effects on radio frequency diode reactively sputtered ZrO.sub.2 films," J. Vac. Sci. Technol. A 8 (6), Nov./Dec. 1990; 3925-3928.
Klinger, R.E., Swab, P., "Evolution of surface roughness and scatter in evaporated zirconia/silica multilayer coatings," SPIE vol. 678 Optical Thin Films II: New Developments (1986); 41-50.
Klinger, Robert E., Carniglia, Charles K., "Optical and Crystalline Inhomogeneity in Evaporated Zirconia," OSA Annual Meeting, Oct. 29-Nov. 2, 1984, San Diego, California.
Beauchamp, William T.; Pond, Brad; Seddon, Ian; Solberg, Scott, "New Capabilities for the Sputtering of Multilayer Optical Coatings," International Conference on Coatings on Glass (ICCG), Saarbr Ycken, Germany, Oct. 27-31, 1996.
Sankur, H.O., "Dielectric Composite Thin Films," Rockwell International Science Center, Nov., 1989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low net stress multilayer thin film coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low net stress multilayer thin film coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low net stress multilayer thin film coatings will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-885825

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.