Low melting, opaque enamel frit

Details Low melting, opaque enamel frit Low melting, opaque enamel frit

1982-10-12

1984-09-04

McCarthy, Helen M.

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

501 17, 501 24, 501 26, 501 77, 501 79, C03C 502

Patent

active

044697988

ABSTRACT:
A low melting, opaque enamel frit is described, which comprises 30 to 36 wt. % of SiO.sub.2, 15 to 20 wt. % of B.sub.2 O.sub.3, 7 to 9 wt. % of Na.sub.2 O, 5 to 10 wt. % of ZrO.sub.2, 10 to 17 wt. % of TiO.sub.2, 7 to 15 wt. % of K.sub.2 O, 2 to 10 wt. % of F.sub.2 and 0.5 to 2.5 wt. % of P.sub.2 O.sub.5. The total of Na.sub.2 O and K.sub.2 O is in the range of 15 to 20 wt. % and the total of TiO.sub.2 and ZrO.sub.2 is in the range of 15 to 20 wt. %. The ZrO.sub.2 /(TiO.sub.2 +ZrO.sub.2) ratio is in the range of 0.25 to 0.5:1 and the SiO.sub.2 /B.sub.2 O.sub.3 ratio is in the range of 1.5 to 2.4:1. In addition, the Na.sub.2 O/K.sub.2 O ratio is in the range of 0.6 to 1.0:1 and the (Na.sub.2 O+K.sub.2 O)/(TiO.sub.2 +ZrO.sub.2) is in the range of 0.7 to 1.2:1.

REFERENCES:
patent: 2324812 (1943-07-01), Bahnsen et al.
patent: 3459574 (1969-08-01), Willcox et al.
patent: 3836373 (1974-09-01), Ault et al.
patent: 3867157 (1975-02-01), Peeling
patent: 4147835 (1979-04-01), Nishino et al.

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