Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics
Reexamination Certificate
2008-05-27
2008-05-27
Purvis, Sue A. (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Integrated circuit structure with electrically isolated...
Passive components in ics
C257S296000, C257S300000, C257S315000, C257S906000, C257SE21008, C257SE21647, C438S957000
Reexamination Certificate
active
07378719
ABSTRACT:
Capacitor structures for use in integrated circuits and methods of their manufacture. The capacitor structures include a bottom electrode, a top electrode and a dielectric layer interposed between the bottom electrode and the top electrode. The capacitor structures further include a metal oxide buffer layer interposed between the dielectric layer and at least one of the bottom and top electrodes. Each metal oxide buffer layer acts to improve capacitance and reduce capacitor leakage. The capacitors are suited for use as memory cells and apparatus incorporating such memory cells, as well as other integrated circuits.
REFERENCES:
patent: 4152490 (1979-05-01), Witzke
patent: 4519851 (1985-05-01), Perry et al.
patent: 4899203 (1990-02-01), Ino
patent: 4937650 (1990-06-01), Shinriki et al.
patent: 5034246 (1991-07-01), Mance et al.
patent: 5122923 (1992-06-01), Matsubara et al.
patent: 5177574 (1993-01-01), Yoneda
patent: 5189503 (1993-02-01), Suguro et al.
patent: 5195018 (1993-03-01), Kwon et al.
patent: 5225286 (1993-07-01), Fujikawa et al.
patent: 5290609 (1994-03-01), Horiike et al.
patent: 5335138 (1994-08-01), Sandhu et al.
patent: 5362632 (1994-11-01), Mathews
patent: 5387480 (1995-02-01), Haluska et al.
patent: 5480748 (1996-01-01), Bakeman et al.
patent: 5558961 (1996-09-01), Doeff et al.
patent: 5582312 (1996-12-01), Niles et al.
patent: 5589733 (1996-12-01), Noda et al.
patent: 5663088 (1997-09-01), Sandhu et al.
patent: 5686748 (1997-11-01), Thakur et al.
patent: 5719425 (1998-02-01), Akram et al.
patent: 5719607 (1998-02-01), Hasegawa et al.
patent: 5741540 (1998-04-01), Li et al.
patent: 5793057 (1998-08-01), Summerfelt
patent: 5814852 (1998-09-01), Sandhu et al.
patent: 5834357 (1998-11-01), Kang
patent: 5838035 (1998-11-01), Ramesh
patent: 5841186 (1998-11-01), Sun et al.
patent: 5851896 (1998-12-01), Summerfelt
patent: 5856937 (1999-01-01), Chu et al.
patent: 5859760 (1999-01-01), Park et al.
patent: 5866460 (1999-02-01), Akram et al.
patent: 5867444 (1999-02-01), Le et al.
patent: 5910880 (1999-06-01), DeBoer et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5936831 (1999-08-01), Kola et al.
patent: 5977581 (1999-11-01), Thakur et al.
patent: 5981333 (1999-11-01), Parekh et al.
patent: 5981350 (1999-11-01), Geusic et al.
patent: 5985714 (1999-11-01), Sandhu et al.
patent: 5985732 (1999-11-01), Fazan et al.
patent: 6008086 (1999-12-01), Schuegraf et al.
patent: 6017789 (2000-01-01), Sandhu et al.
patent: 6025257 (2000-02-01), Jeon
patent: 6037235 (2000-03-01), Narwankar et al.
patent: 6078493 (2000-06-01), Kang
patent: 6083765 (2000-07-01), Tempel
patent: 6090697 (2000-07-01), Xing et al.
patent: 6124769 (2000-09-01), Igarashi et al.
patent: 6165834 (2000-12-01), Agarwal et al.
patent: 6183255 (2001-02-01), Oshida
patent: 6194227 (2001-02-01), Hase
patent: 6204203 (2001-03-01), Narwankar et al.
patent: 6207561 (2001-03-01), Hwang et al.
patent: 6215650 (2001-04-01), Gnade et al.
patent: 6218256 (2001-04-01), Agarwal
patent: 6235572 (2001-05-01), Kunitomo et al.
patent: 6248640 (2001-06-01), Nam
patent: 6255698 (2001-07-01), Gardner et al.
patent: 6265260 (2001-07-01), Alers et al.
patent: 6271085 (2001-08-01), Yamamoto
patent: 6284655 (2001-09-01), Marsh
patent: 6291290 (2001-09-01), Arita
patent: 6294425 (2001-09-01), Hideki
patent: 6303426 (2001-10-01), Alers
patent: 6320244 (2001-11-01), Alers et al.
patent: 6339009 (2002-01-01), Lee et al.
patent: 6352865 (2002-03-01), Lee et al.
patent: 6355492 (2002-03-01), Tanaka et al.
patent: 6362068 (2002-03-01), Summerfelt et al.
patent: 6387749 (2002-05-01), Lim
patent: 6391801 (2002-05-01), Yang
patent: 6403415 (2002-06-01), Alers et al.
patent: 6417537 (2002-07-01), Yang et al.
patent: 6448128 (2002-09-01), Lee et al.
patent: 6451646 (2002-09-01), Lu et al.
patent: 6454914 (2002-09-01), Nakamura
patent: 6475854 (2002-11-01), Narwankar et al.
patent: 6475856 (2002-11-01), Yang
patent: 6524867 (2003-02-01), Yang et al.
patent: 6541330 (2003-04-01), Lee et al.
patent: 6548368 (2003-04-01), Narwankar et al.
patent: 6596583 (2003-07-01), Agarwal et al.
patent: 6599807 (2003-07-01), Lim et al.
patent: 6617248 (2003-09-01), Yang
patent: 6631069 (2003-10-01), Yang et al.
patent: 7018868 (2006-03-01), Yang et al.
patent: 2001/0024387 (2001-09-01), Raaijmakers et al.
patent: 2002/0022334 (2002-02-01), Yang et al.
patent: 2002/0036313 (2002-03-01), Yang et al.
patent: 2002/0070414 (2002-06-01), Drescher et al.
patent: 2002/0074584 (2002-06-01), Yang
patent: 2002/0164863 (2002-11-01), Murphy
patent: 2005/0167726 (2005-08-01), Lu et al.
patent: 2005/0224897 (2005-10-01), Chen et al.
patent: 2005/0287751 (2005-12-01), Mehrah et al.
patent: WO-0041459 (2000-07-01), None
CRC Handbook of Chemistry and Physics (3rdElectronic Edition) © 2000 p. 12-48 to 12-56.
CRC Handbook of Chemistry and Physics (3rdElectronic Edition) Copyright 2000 p. 12-48 to 12-56.
S. Dierks, Material Saftey Data Sheet for Tungsten Oxide, Jun. 1994, ESPI Metals Inc., http://www.espi-metals.com/msds.htm.
Time Domain CVD, http://www.timedomaincvd.com/CVD—Fundamentals/films/Ta2O5.html, High Dielectric constant Materials for DRAMS: Tantalum Oxide. Chart listing dielectric constants of SiO2, Si3N4, Ta2O5, BST.
LeGore, L.J., et al., “Controlled Growth of WO3 Films”,J. Vac. Sci. Technol., A 15(3), 1223-1227, (May 1997).
U.S. Appl. No. 10/215,462 Amendment and Response filed Sep. 21, 2004 to Final Office Action mailed Jun. 25, 2004, 15 pgs.
U.S. Appl. No. 10/215,462 Amendment and Response filed Oct. 11, 2005, to Final Office Action mailed Jul. 8, 2005, 22 pgs.,
U.S. Appl. No. 10/215,462 Amendment and Response under 37 CFR 1.116 filed Jan. 10, 2007 to Final Office Action mailed Aug. 3, 2006, 17 pgs.
U.S. Appl. No. 10/215,462 Final Office Action mailed Jun. 25, 2004, 12 pgs.
U.S. Appl. No. 10/215,462 Final Office Action mailed Jul. 8, 2005, 11 pgs.
U.S. Appl. No. 10/215,462 Final Office Action mailed Aug. 3, 2006, 18 pgs.
U.S. Appl. No. 10/215,462 Non/Final Office Action mailed Jan. 4, 2005, 12 pgs.
U.S. Appl. No. 10/215,462 Non/Final Office Action mailed Mar. 22, 2007, 12 pgs.
U.S. Appl. No. 10/215,462 Non/Final Office Action mailed Sep. 23, 2003, 9 pgs.
U.S. Appl. No. 10/215,462 Non/Final Office Action mailed Dec. 22, 2005, 14 pgs.
U.S. Appl. No. 10/215,462 Response filed Apr. 29, 2005 to Non/Final Office Action mailed Jan. 4, 2005, 18 pgs.
U.S. Appl. No. 10/215,462 Response filed May 22, 2006 to Non/Final Office Action mailed Dec. 22, 2005, 24 pgs.
U.S. Appl. No. 10/215,462 Response filed Jun. 21, 2007 to Non/Final Office Action mailed Mar. 22, 2007, 20 pgs.
U.S. Appl. No. 10/215,462 Response filed Dec. 23, 2003 to Non/Final Office Action mailed Sep. 23, 2003, 16 pgs.
U.S. Appl. No. 10/215,462 Notice of Allowance and Fee(s) Due mailed Aug. 15, 2007, 4 pgs.
Micro)n Technology, Inc.
Purvis Sue A.
Schwegman Lundberg & Woessner, P.A.
Wilson Scott R.
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