Low k polymer E-beam printable mechanical support

Semiconductor device manufacturing: process – Making device array and selectively interconnecting – Rendering selected devices operable or inoperable

Reexamination Certificate

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C438S618000, C438S623000, C438S624000, C438S631000, C438S633000, C438S778000, C438S781000

Reexamination Certificate

active

06972217

ABSTRACT:
A low-k interconnect dielectric layer is strengthened by forming pillars of hardened material in the low-k film. An E-beam source is used to expose a plurality of pillar locations. The locations are exposed with a predetermined power and exposure time to convert the low-k film in the selected locations to pillars having higher hardness and strength than the surrounding portions of the low-k film.

REFERENCES:
patent: 6077764 (2000-06-01), Sugiarto et al.
patent: 6080526 (2000-06-01), Yang et al.
patent: 6245663 (2001-06-01), Zhao et al.
patent: 2003/0087191 (2003-05-01), Lavallee et al.
patent: 2004/0048960 (2004-03-01), Peterson et al.
patent: 2004/0058277 (2004-03-01), He et al.

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