Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2006-12-05
2006-12-05
Vu, Hung (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257S644000, C257S751000, C257S752000, C257S761000, C257S763000
Reexamination Certificate
active
07145245
ABSTRACT:
The present invention discloses a method including providing a substrate; forming a dielectric over the substrate, the dielectric having a k value of about 2.5 or lower, the dielectric having a Young's modulus of elasticity of about 15 GigaPascals or higher; forming an opening in the dielectric; and forming a conductor in the opening.The present invention further discloses a structure including a substrate; a dielectric located over the substrate, the dielectric having a k value of 2.5 or lower, the dielectric having a Young's modulus of elasticity of about 15 GigaPascals or higher; an opening located in the dielectric; and a conductor located in the opening.
REFERENCES:
patent: 6010962 (2000-01-01), Liu et al.
patent: 6323120 (2001-11-01), Fujikawa et al.
patent: 6451712 (2002-09-01), Dalton et al.
patent: 6472306 (2002-10-01), Lee et al.
patent: 6806161 (2004-10-01), Ko et al.
patent: 2003/0224593 (2003-12-01), Wong
Kloster Grant
Leu Jihperng
Rockford Lee
Chen George
Intel Corporation
Vu Hung
LandOfFree
Low-k dielectric film with good mechanical strength that... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Low-k dielectric film with good mechanical strength that..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low-k dielectric film with good mechanical strength that... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3689066