Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From reactant having at least one -n=c=x group as well as...
Patent
1990-02-23
1992-06-30
Kight, III, John
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From reactant having at least one -n=c=x group as well as...
528 67, 528 85, 528374, C08G 1838, C08G 1852, C08G 1887
Patent
active
051264250
ABSTRACT:
There are here provided a low-hygroscopic sulfur-containing and crosslinked structure-having urethane resin, urethane resin plate and shape-recoverable molding article which is prepared by first selecting a polyisocyanate compound having m (which is an integer of 2 or more) isocyanate groups in one molecule and a polythiol compound having n (which is an integer of 2 or more) thiol groups in one molecule so that the total number of m+n may be 5 or more, and then polymerizing the composition of the polyisocyanate compound and the polythiol compound; a low-hygroscopic sulfur-containing urethane coating material which comprises the above composition; and a low-hygroscopic sulfur-containing urethane adhesive which comprises the composition. In the resin of the present invention, its water absorption is as low as a level of 0.02 to 0.20% by weight, and its adhesion to a hard coating film is also good. The coating material and the adhesive of the present invention have a long pot life, a low water absorption and a high adhesive force even after dipping in warm water.
REFERENCES:
patent: 3114734 (1963-12-01), Gobran et al.
patent: 3124544 (1964-03-01), Proops
patent: 3591560 (1971-07-01), Wagner et al.
patent: 3640965 (1972-02-01), Brode et al.
patent: 3681272 (1972-08-01), Gloskey
patent: 4525570 (1985-06-01), Blum et al.
patent: 4680369 (1987-07-01), Kajimoto et al.
patent: 4689387 (1987-08-01), Kajimoto et al.
patent: 4775733 (1988-10-01), Kanemura et al.
patent: 4945127 (1990-07-01), Kagawa et al.
patent: 4950258 (1990-08-01), Kawai et al.
patent: 5049591 (1991-09-01), Hayashi et al.
patent: 5057252 (1991-10-01), Kagawa et al.
Saunders et al, "Polyurethane", p. 617.
Imai Masao
Kanemura Yoshinobu
Sasagawa Katsuyoshi
Kight III John
Mitsui Toatsu Chemicals Inc.
Sergent Rabon
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