Low frequency, pulsed, bipolar power supply for a plasma chamber

Details Low frequency, pulsed, bipolar power supply for a plasma chamber Low frequency, pulsed, bipolar power supply for a plasma chamber

1992-07-30

1994-04-12

Beha, Jr., William H.

Electric power conversion systems

Current conversion

With means to selectively provide d.c. of either polarity

20429808, 31511121, 363 98, H02M 742

Patent

active

053031393

ABSTRACT:
The invention relates to a bi-polar power supply for a plasma chamber including an adjustable DC power supply having a positive output terminal and a negative output terminal. A transistor bridge circuit having two input bridge terminals is coupled to the positive and negative output terminals. Two bridge output terminals of the transistor bridge are coupled to the plasma chamber. A current detector is coupled to the two bridge output terminals for detecting the current flowing to the plasma chamber and controlling the transistor bridge circuit to provide a bi-polar power supply to the plasma chamber.

REFERENCES:
patent: 4454573 (1984-06-01), Petsch et al.
patent: 4719558 (1988-01-01), Hanada et al.
patent: 4724296 (1988-02-01), Morley
patent: 4780803 (1988-10-01), Garcia-Santamaria
patent: 5130003 (1992-07-01), Conrad

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