Low frequency process-variation-insensitive...

Details Low frequency process-variation-insensitive... Low frequency process-variation-insensitive...

2007-12-13

2010-12-28

Summons, Barbara (Department: 2817)

Wave transmission lines and networks

Coupling networks

Electromechanical filter

C333S188000, C333S200000, C310S309000, C331S154000

Reexamination Certificate

active

07859365

ABSTRACT:
Disclosed are micromechanical resonators having features that compensate for process variations and provide improved inherent temperature stability. Exemplary resonators may comprise comb drive resonators or parallel-plate drive resonators. The resonators comprise a (silicon-on-insulator) substrate with resonator apparatus formed therein. The resonator apparatus has one or more anchors connected to the substrate, at least one excitation/sense port that is electrically insulated from the substrate, and a resonator. The resonator comprises one or more flexural members connected to the one or more anchors that are separated from the substrate and separated from the excitation/sense port by gaps. A mass is coupled to flexural members, is separated from the substrate, and comprises a grid. Process compensation is achieved using a resonator mass in the form of a grid of lines that form holes or lines through the mass, wherein widths of lines of the grid are approximately ⅓ the width of the flexural members. Temperature stability is provided using silicon dioxide on at least one of the surfaces of the flexural members.

REFERENCES:
patent: 5025346 (1991-06-01), Tang et al.
patent: 5640133 (1997-06-01), MacDonald et al.
patent: 6393913 (2002-05-01), Dyck et al.
patent: 6445106 (2002-09-01), Ma et al.
patent: 6630871 (2003-10-01), Ma et al.
patent: 6744174 (2004-06-01), Paden et al.
patent: 6940370 (2005-09-01), Bircumshaw et al.
patent: 6978673 (2005-12-01), Johnson et al.
patent: 7071793 (2006-07-01), Lutz et al.
patent: 7176770 (2007-02-01), Ayazi et al.
patent: 7511870 (2009-03-01), Ho et al.
patent: 7542188 (2009-06-01), Zhou et al.
patent: 2002/0127760 (2002-09-01), Yeh et al.
patent: 2005/0073078 (2005-04-01), Lutz et al.
patent: 2009/0189481 (2009-07-01), Kaajakari

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