Metal treatment – Compositions – Heat treating
Patent
1976-08-11
1977-08-23
Ozaki, G.
Metal treatment
Compositions
Heat treating
148 335, 148187, H01L 2126
Patent
active
040438376
ABSTRACT:
A thyristor is provided with a low forward voltage drop (V.sub.f) while providing a typical gate current to trigger (I.sub.g). The working point in the cathode-base region of the thyristor has an impurity concentration less than 5 .times. 10.sup.15 and preferably less than 1 .times. 10.sup.15 per cm.sup.3. The gating portion of the device is selectively irradiated, preferably with electron radiation, to maintain the gate current. The forward blocking voltage (V.sub.BO) and rate of rise of application of forward voltage (dV/dt) of the thyristor may also be maintained at typical values by a fine shunt pattern and/or doping of the shunt portions.
REFERENCES:
patent: 3246172 (1966-04-01), Sanford
patent: 3390020 (1968-06-01), Mandelkorn
patent: 3442722 (1969-05-01), Bauerlein et al.
patent: 3470036 (1969-09-01), Svedberg
patent: 3809582 (1974-05-01), Tarneja et al.
patent: 3881964 (1975-05-01), Cresswell et al.
patent: 3933527 (1976-01-01), Tarneja et al.
patent: 3990091 (1976-11-01), Cresswell et al.
Cresswell Michael W.
Roberts John S.
Menzemer C. L.
Ozaki G.
Westinghouse Electric Corporation
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