Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-09-12
2009-12-08
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C428S428000
Reexamination Certificate
active
07629089
ABSTRACT:
A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.
REFERENCES:
patent: 4111698 (1978-09-01), Sato
patent: 6048652 (2000-04-01), Nguyen et al.
patent: 6576380 (2003-06-01), Davis et al.
patent: 6951502 (2005-10-01), Koike et al.
patent: 2003/0186624 (2003-10-01), Koike et al.
patent: 10-154321 (1998-06-01), None
patent: 2003-505891 (2003-02-01), None
patent: WO 01/07967 (2001-02-01), None
“Specification For Extreme Ultraviolet Lithography Mask Substrates”, XP009101509, Semi P37-1102, 2001, 2002, pp. 1-10.
Nakajima et al, Proceedings of SPIE, vol. 5446 (SPIE, Bellingham, WA 2004) pp. 812-823.
Documents from EP 05737006.0 dated May 13, 2008 and Oct. 15, 2008.
Ito Masabumi
Mishiro Hitoshi
Asahi Glass Company Limited
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Rosasco Stephen
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