Low energy, steered ion beam deposition system having high curre

Details Low energy, steered ion beam deposition system having high curre Low energy, steered ion beam deposition system having high curre

1991-04-29

1993-04-27

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250423R, H01J 2718

Patent

active

052065162

ABSTRACT:
An ion beam deposition system in which ions of different masses and from different sources are independently steered into different parts of an analyzer magnet to be converged into a single wide beam which maintains a perpendicular relationship between the beam and the target. The beam is decelerated by a slit type deceleration lens to an energy suitable for deposition. The target is then scanned across the decelerated beam. The beam is maintained at high current and low pressure by confining electrons away from the magnet and/or adding energy to the low pressure atmosphere inside the analyzer magnet to produce a plasma of electrons and charged particles in order to provide adequate neutralizing of the space charge of the beam.

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