Low energy ion doping of growing diamond by CVD

Details Low energy ion doping of growing diamond by CVD Low energy ion doping of growing diamond by CVD

1991-08-08

1993-08-10

King, Roy

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427523, 427569, 427577, 427249, 427122, 423446, B05D 306, C23C 1600

Patent

active

052347249

ABSTRACT:
A diamond growing by chemical vapor deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the diamond. This doping method will work well for any dopant that is substantially immobile in the diamond at the temperature necessary for deposition growth.

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