Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1980-12-10
1982-09-28
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
29599, 357 5, 204192E, 427 38, 427 62, C23C 1500, H01L 3922
Patent
active
043517129
ABSTRACT:
A surface reaction process for controlled oxide growth is disclosed using a directed, low energy ion beam for compound or oxide formation. The technique is evaluated by fabricating Ni-oxide-Ni and Cr-oxide-Ni tunneling junctions, using directed oxygen ion beams with energies ranging from about 30 to 180 eV. In one embodiment, high ion current densities are achieved at these low energies by replacing the conventional dual grid extraction system of the ion source with a single fine mesh grid. Junction resistance decreases with increasing ion energy, and oxidation time dependence shows a characteristic saturation, both consistent with a process of simultaneous oxidation and sputter etching, as in the conventional r.f. oxidation process. In contrast with r.f. oxidized junctions, however, ion beam oxidized junctions contain less contamination by backsputtering, and the quantitative nature of ion beam techniques allows greater control over the growth process.
REFERENCES:
patent: 3849276 (1974-11-01), Greiner
patent: 4259145 (1981-03-01), Harper et al.
patent: 4299679 (1981-11-01), Suzuki
G. Kaus et al., "Method of Producing Very Thin Oxide Layers on Substrates", IBM Tech. Disc. Bull., vol. 21, p. 654, (1978).
J. M. E. Harper et al., "Dual-Ion-Beam Technique for Pinhole-Free Thin Films of Controlled Thickness", IBM Tech. Disc. Bull., vol. 23, pp. 821-822, (1980).
A. W. Kleinsasser et al., "High-Quality Submicron Niobium Tunnel Junctions With Reactive-Ion-Beam Oxidation", Appl. Phys. Lett., vol. 37, pp. 841-843, (1980).
Cuomo Jerome J.
Harper James M. E.
International Business Machines - Corporation
McGee Hansel L.
Stanland Jackson E.
Weisstuch Aaron
Young Philip
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