Low density radionuclide-containing particulate material

Details Low density radionuclide-containing particulate material Low density radionuclide-containing particulate material

2006-02-14

2006-02-14

Jones, Dameron L. (Department: 1618)

Drug, bio-affecting and body treating compositions

Radionuclide or intended radionuclide containing; adjuvant...

Coated, impregnated, or colloidal particulate

C424S001110, C424S001290, C424S001330, C424S001650

Reexamination Certificate

active

06998105

ABSTRACT:
The invention relates to a particulate material consisting of a low density radiation-tolerant glass and a radionuclide incorporated into the low density glass or coated on the low density glass, the glass having a density of less than 2.5 g/cm3, processes for its production and a method of radiation therapy utilising the patentable material.

REFERENCES:
patent: 4889707 (1989-12-01), Day et al.
patent: 5362473 (1994-11-01), Panek
patent: 5885547 (1999-03-01), Gray
patent: 6149889 (2000-11-01), Chin et al.
patent: 6258338 (2001-07-01), Gray
patent: 6537518 (2003-03-01), Gray
patent: 2002/0197207 (2002-12-01), Ruys et al.
patent: 2003/0203205 (2003-10-01), Bi et al.
patent: 8603124 (1986-06-01), None
patent: 9519841 (1995-07-01), None
patent: 0045826 (2000-08-01), None
Shepherd, F. et al.,Cancer, vol. 70, No. 9, pp. 2250-2254 (Nov. 1, 1992).
Burton, M.A. et al.,Europ. J. Cancer Clin. Oncol., 25:1487-1491 (1989).
Burton, M.A. et al.,Europ. J. Cancer Clin. Oncol., 24(8):1373-1376 (1988).
Meade, V. et al.,Europ. J. Cancer Clin. Oncol., 23:37-41 (1987).

Affiliated with

Also associated with

Rating

Low density radionuclide-containing particulate material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low density radionuclide-containing particulate material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low density radionuclide-containing particulate material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3686016