Low-density cleaning substrate

Details Low-density cleaning substrate Low-density cleaning substrate

2011-05-24

2011-05-24

Salvatore, Lynda (Department: 1786)

Fabric (woven, knitted, or nonwoven textile or cloth, etc.)

Coated or impregnated woven, knit, or nonwoven fabric which...

Coating or impregnation functions biologically

C442S400000, C442S401000, C442S402000, C442S408000, C442S219000, C442S220000

Reexamination Certificate

active

07947613

ABSTRACT:
The present invention is directed to a low-density substrate, which has an optimized pore volume distribution. The optimized pore volume distribution allows the substrate to hold at least 50 percent of its cumulative volume within pores with a radius size of about 110 to 250 microns. The optimized pore volume distribution can also be characterized by having a dry fibrous web that absorbs less than 20 percent of the cumulative volume of the fibrous web at a pore radius of 75 microns. The optimized pore volume distribution of the substrate enables it to controllably release a fluid composition effectively onto a surface. The basis weight of the substrate is about 80 to 20 gsm and the density of the substrate is below 0.1 g/cc. The substrate may be a pre-loaded wipe, which is either moistened by a consumer prior to use or moistened prior to packaging. The composition loaded onto the substrate may contain dry and/or liquid compositions preferably for cleaning hard or soft surfaces.

REFERENCES:
patent: 4042453 (1977-08-01), Conway et al.
patent: 5342534 (1994-08-01), Skrobala et al.
patent: 5650214 (1997-07-01), Anderson et al.
patent: 6172276 (2001-01-01), Hetzler et al.
patent: 6361784 (2002-03-01), Brennan et al.
patent: 2003/0118816 (2003-06-01), Polanco et al.
patent: 2003/0203162 (2003-10-01), Fenwick et al.
patent: 2004/0131820 (2004-07-01), Turner et al.
patent: 2005/0090175 (2005-04-01), Bergholm et al.
patent: 2005/0120497 (2005-06-01), Lynde et al.
patent: 0664842 (1995-08-01), None
patent: 1074234 (2001-07-01), None
patent: WO0066057 (1990-11-01), None
patent: WO2004098869 (2004-11-01), None

Affiliated with

Also associated with

Rating

Low-density cleaning substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low-density cleaning substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low-density cleaning substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2625427