X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-09-30
1994-04-26
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, 378145, G21K 106
Patent
active
053073959
ABSTRACT:
A mirror for reflecting radiation at a desired wavelength in the soft x-ray region, comprises a substrate and a coating on the substrate. The coating contains a first section and a second section. The first section comprises at least one layer made up of at least a spacer sublayer and a nodal sublayer. The optical thickness of each spacer sublayer is selected so that, upon application of the radiation of desired wavelength, the mirror generates a standing wave having a node in the middle of each nodal sublayer. The second section is disposed between the first section and the substrate, and comprises a plurality of optically absorptive layers.
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Hunter William R.
Seely John F.
Kalish Daniel
McDonnell Thomas E.
Porta David P.
The United States of America as represented by the Secretary of
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