Low-contamination method for comminuting solid silicon fragments

Details Low-contamination method for comminuting solid silicon fragments Low-contamination method for comminuting solid silicon fragments

1989-03-22

1989-10-03

Eley, Timothy V.

Solid material comminution or disintegration

Processes

With heating or cooling of material

241 24, B02L 2308

Patent

active

048711179

ABSTRACT:
A method for lowering the risk of contamination during comminution of solid silicon fragments produces in a first step a temperature gradient in the solid silicon fragments. This temperature gradient results from the action of heat applied from the outside. A second temperature gradient is then produced, whose direction is rapidly at least partly reversed in a second step. This treatment effects a decompacting which makes it possible to use, in a subsequent mechanical comminution step, tools whose contact surfaces are composed of silicon or of hard materials, for example, based on nitride or carbide. The product obtained is remarkable for its uniform grain size distribution and also for its high purity in fine grain size categories. In addition, the low forces required for the comminution makes possible a longer service life for the tools used.

REFERENCES:
patent: 4565913 (1986-01-01), Yakurugi et al.
patent: 4659022 (1987-04-01), Seider et al.
patent: 4722483 (1988-02-01), Saville et al.
patent: 4771950 (1988-09-01), Coblenr et al.

Affiliated with

Also associated with

Rating

Low-contamination method for comminuting solid silicon fragments does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low-contamination method for comminuting solid silicon fragments, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low-contamination method for comminuting solid silicon fragments will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-659758