Low concentration trivalent chromium electroplating solution and

Details Low concentration trivalent chromium electroplating solution and Low concentration trivalent chromium electroplating solution and

1979-10-18

1981-07-14

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

204 51, C25D 310, C25D 514

Patent

active

042785120

ABSTRACT:
A very low concentration (below 0.03 M) trivalent chromium plating bath in which the source of chromium is an equilibrated aqueous solution of a chromium (III) - thiocyanate complex gives a deposit of unexpectedly light color. Such a bath is employed to produce thin overcoatings of light colored chromium for decorative applications. The bath and process is also used to plate the initial layer of a thick (greater than 5 micron) deposit for engineering applications, the major part of which is plated from a higher chromium concentration bath. Such thick deposits from a higher concentration bath are more cohesive and smoother when plated over an initial layer from the low concentration bath.

REFERENCES:
patent: 4062737 (1977-12-01), Barclay et al.
patent: 4141803 (1979-02-01), Barclay et al.
patent: 4161432 (1979-07-01), Barclay et al.
Donald J. Barclay et al., Inorganic Chemistry, vol. 9, No. 5, pp. 1024-1030, (1970).

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