Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1997-11-05
1999-01-26
Chapman, Mark
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20419212, 20419217, 438658, 438664, 438683, C23C 1434
Patent
active
058633936
ABSTRACT:
An alloy or composite is deposited in a recess feature of a semiconductor substrate by sputtering an alloy or composite target into a recess, to form a first layer of deposited material. The first layer of deposited material is resputtered at a low angle and low energy, to redeposit the first layer of deposited material onto the bottom of the recess as a second layer of deposited material having a different stoichiometry than that of the first deposited material. In a further embodiment, a sputtering chamber ambient is comprised of argon and nitrogen. In yet a further embodiment, the resputtering step is followed by deposition of at least one layer of material with a different stoichiometry than that of the second deposited layer, to form a "graded" stoichiometry of material deposited in the recess.
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Chapman Mark
Micro)n Technology, Inc.
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