Low and reverse pressure application hydrodynamic...

Seal for a joint or juncture – Process of dynamic sealing – Close proximity seal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C277S416000

Reexamination Certificate

active

08074995

ABSTRACT:
The present invention relates to circumferential seal ring segments positioned around a rotating shaft so as to prevent fluids from leaking from a lubricant sump during both low and high pressure conditions. The circumferential seal is comprised of a plurality of adjoining annular ring segments facing the rotating shaft. Each sealing ring segment includes a dead end circumferential groove on a shaft-side face of each sealing ring such that, when the segments are joined, the circumferential dead end groove of each segment extends arcuately in the direction of shaft rotation. At least one additional groove is contained on the shaft-side face of each sealing ring segment. The additional groove(s) directs and creates pressurized air within the dead end circumferential groove, either directly or indirectly maintaining a seal between the ring segments and the shaft. A bleed hole may also be provided to create a seal between each sealing segment.

REFERENCES:
patent: 3575424 (1971-04-01), Taschenberg
patent: 4943069 (1990-07-01), Jinnouchi
patent: 5169159 (1992-12-01), Pope et al.
patent: 5509664 (1996-04-01), Borkiewicz
patent: 6145843 (2000-11-01), Hwang
patent: 6692006 (2004-02-01), Holder

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Low and reverse pressure application hydrodynamic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Low and reverse pressure application hydrodynamic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Low and reverse pressure application hydrodynamic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4303719

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.