Electric heating – Heating devices – Combined with container – enclosure – or support for material...
Patent
1987-03-13
1989-04-11
Walberg, Teresa J.
Electric heating
Heating devices
Combined with container, enclosure, or support for material...
219354, 219347, 219343, H05B 3124
Patent
active
048209066
ABSTRACT:
An long arc gas-discharge lamp for rapidly heating a semiconductor wafer. The spectral output of the lamp is specifically matched to the absorption characteristics of the particular semiconductor wafer being heating by choosing an appropriate gas or mixture of gases. The electrodes of the long arc lamp are separated by a distance greater than the largest dimension of the semiconductor wafer to insure that the entire wafer is illuminated at one time. In addition, the lamp has a high power density to raise the temperature of the semiconductor wafer to the required process temperature. Large diameter metal electrodes are used to conduct more heat from the ends of the lamp. The electrodes contain a low work function metal such as thorium oxide to increase the electron emission. The enclosing glass capillary has thin walls between the electrodes for improved heat dissipation. The glass capillary is cooled to carry the heat away from the lamp.
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Reinhold, Hermann D., "Neue Bauelemente . . . ", Klepzig Fachberichte (Germany), vol. 79, Apr. 1971, No. 4, pp. 207-211.
Peak Systems, Inc.
Walberg Teresa J.
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