Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-09-26
2006-09-26
Mehta, Bhavesh M. (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C358S448000
Reexamination Certificate
active
07113627
ABSTRACT:
A method of locating a linear defect on a photographic element, the element having a useful imaging width and the defect aligned with length of the element, includes the steps of: exposing a region of the element to create a latent image which is substantially uniform across the useful imaging width of the element; developing the latent image to produce a density signal; sampling the density signal with a photometric device; and analyzing the sampled density data for the presence of significant deviations aligned with the length of the element to locate the defect.
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Cahill Nathan D.
Spence John P.
Eastman Kodak Company
Leipold Paul A.
Mehta Bhavesh M.
Perungavoor Sath V.
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