Localized vacuum apparatus and method

Details Localized vacuum apparatus and method Localized vacuum apparatus and method

1989-02-24

1992-04-07

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044011, 25044111, H01J 3718, H01J 3302

Patent

active

051031027

ABSTRACT:
An apparatus for generating a localized, non-contact vacuum seal at a selected process region of a workpiece surface includes a vacuum body with a workpiece-facing surface having a plurality of concentric grooves and a central bore thorugh which a process energy beam can be transmitted. A method of generating a localized vacuum seal includes placing the vacuum body into selected proximity with the process region of the workpiece surface, and differentially evacuating the grooves, thereby defining differentially pumped vacuum chambers which reduce the influx of atmospheric particles to the process region. A selected control gas can be introduced into a vacuum body groove to further reduce the influx of atmospheric particles to the process region, and selected process gases can be introduced into the vacuum body to react with the process beam.

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