Localized synthesis and self-assembly of nanostructures

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – Forming a platelet shape or a small diameter – elongate,...

Reexamination Certificate

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C117S088000, C117S095000

Reexamination Certificate

active

11027749

ABSTRACT:
Systems and methods for local synthesis of silicon nanowires and carbon nanotubes, as well as electric field assisted self-assembly of silicon nanowires and carbon nanotubes, are described. By employing localized heating in the growth of the nanowires or nanotubes, the structures can be synthesized on a device in a room temperature chamber without the device being subjected to overall heating. The method is localized and selective, and provides for a suspended microstructure to achieve the thermal requirement for vapor deposition synthesis, while the remainder of the chip or substrate remains at room temperature. Furthermore, by employing electric field assisted self-assembly techniques according to the present invention, it is not necessary to grow the nanotubes and nanowires and separately connect them to a device. Instead, the present invention provides for self-assembly of the nanotubes and nanowires on the devices themselves, thus providing for nano-to micro-integration.

REFERENCES:
patent: 2002/0127170 (2002-09-01), Hong et al.
patent: 2003/0042128 (2003-03-01), Harutyunyan et al.
patent: 2005/0202185 (2005-09-01), Greengard et al.
patent: 2005/0253220 (2005-11-01), Lin et al.
patent: 2005/0287297 (2005-12-01), Birls et al.

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