Localized substrate geometry characterization

Details Localized substrate geometry characterization Localized substrate geometry characterization

2009-08-28

2011-11-22

Kundu, Sujoy (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Dimensional determination

C702S167000, C702S170000, C702S172000, C702S179000, C702S180000, C702S181000, C702S189000, C702S190000, C702S191000, C702S193000, C702S194000

Reexamination Certificate

active

08065109

ABSTRACT:
A system for evaluating the metrological characteristics of a surface of a substrate, the system including an optical substrate measurement system, a data analyzing system for analyzing data in an evaluation area on the substrate, applying feature-specific filters to characterize the surface of the substrate, and produce surface-specific metrics for characterizing and quantifying a feature of interest, the surface-specific metrics including a range metric for quantifying maximum and minimum deviations in the evaluation area, a deviation metric for quantifying a point deviation having a largest magnitude in a set of point deviations, where the point deviations are an amount of deviation from a reference plane fit to the evaluation area, and a root mean square metric calculated from power spectral density.

REFERENCES:
patent: 6503767 (2003-01-01), Korovin
patent: 7161669 (2007-01-01), Velidandla et al.
patent: 7442908 (2008-10-01), Schuster
patent: 2008/0018887 (2008-01-01), Chen et al.
patent: 9915851 (1999-04-01), None

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