Local oxidation method with bird's beak suppression

Details Local oxidation method with bird's beak suppression Local oxidation method with bird's beak suppression

1993-09-20

1996-04-02

Fourson, George

Fishing, trapping, and vermin destroying

H01L 2176

Patent

active

055040349

ABSTRACT:
A method for eliminating the bird's beak from selective oxidations of semiconductor electronic devices having a semiconductor substrate (1) which is covered by a pad oxide layer (2) covered, in turn, by a first layer (3) of nitride, and wherein at least one vertical-walled pit (11) is defined for growing an isolation region, comprises the sequential steps of: selectively etching the oxide layer (2) within the pit (11) to define peripheral recesses (6,8) between the substrate (1) and the nitride; filling the recesses (6,8) with nitride; and growing oxide in the pit (11) so as to form the isolation region contrasting the nitride portions (9,10) which occlude the recesses (6,8).

REFERENCES:
patent: 4563227 (1986-01-01), Sakai et al.
patent: 5254494 (1993-10-01), Van der Plas et al.
IBM Technical Disclosures Bulletin, vol. 24, No. 9 Feb. '82 New York, USA pp. 4744-4745.
Chiu et al., "The SWAMI--A Defect Free and Near-Zero Bird's-Beak Local Oxidation Process and Its Application in VLSI Technology," 1982 IEDM 224ff.
"A new fully recessed-oxide field isolation technology for scaled VLSI Circuit fabrication," IEEE Electron Device Letters, vol. EDL-7, No. 2, Feb. 1986, pp. 124-126.

Affiliated with

Also associated with

Rating

Local oxidation method with bird's beak suppression does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Local oxidation method with bird's beak suppression, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Local oxidation method with bird's beak suppression will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2016060