Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-01-07
1998-05-12
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25044211, 414225, 414222, H01J 3720
Patent
active
057510032
ABSTRACT:
The present invention provides a loadlock assembly for a high throughput ion implantation system that rapidly and efficiently processes large quantities of workpieces, such as flat panel displays. The loadlock assembly increases the throughput of the implantation system by continuously cycling workpieces through the process chamber, thus increasing the system's throughput. The loadlock assembly includes a plurality of loadlock stacking elements that are axially positioned relative to each other to form a stacked array of loadlocks. Additionally, the loadlocks of the array are configured to nest with an adjacent loadlock to form a stackable and nestable loadlock assembly.
REFERENCES:
patent: 3954191 (1976-05-01), Wittkower
patent: 4228358 (1980-10-01), Ryding
patent: 4229655 (1980-10-01), Ryding
patent: 4234797 (1980-11-01), Ryding
patent: 4258266 (1981-03-01), Robinson et al.
patent: 4346301 (1982-08-01), Robinson et al.
patent: 4433951 (1984-02-01), Koch et al.
patent: 4517465 (1985-05-01), Gault et al.
patent: 4550239 (1985-10-01), Uehara et al.
patent: 4553069 (1985-11-01), Purser
patent: 4568234 (1986-02-01), Lee et al.
patent: 4705951 (1987-11-01), Layman et al.
patent: 4745287 (1988-05-01), Turner
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4851692 (1989-07-01), Villano
patent: 4899059 (1990-02-01), Freytsis et al.
patent: 4911103 (1990-03-01), Davis et al.
patent: 4917556 (1990-04-01), Stark et al.
patent: 5229615 (1993-07-01), Brune et al.
patent: 5306918 (1994-04-01), Goudonnet et al.
patent: 5308989 (1994-05-01), Brubaker
patent: 5404894 (1995-04-01), Shiraiwa
patent: 5478195 (1995-12-01), Usami
patent: 5515986 (1996-05-01), Turlot et al.
Brailove Adam A.
Rose Peter H.
Eaton Corporation
Engellenner Thomas J.
Laurentano Anthony A.
Nguyen Kiet T.
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