Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-08-03
1995-06-06
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429828, 118730, 118733, 414217, 414221, C23C 1456
Patent
active
054219795
ABSTRACT:
Vacuum coating apparatus (30) includes a coating chamber (32), and a load-lock chamber (34) connected to the coating chamber via a high vacuum valve (44). The coating chamber includes deposition-devices (123) and a cylindrical or drum shaped substrate-transporter (100) for transporting substrates (64) past the deposition-devices. Substrates are carried on substrate-carriers (66) which are configured to fit into transport-stations (102) around the periphery of the substrate-transporter. A magazine (61) holding a plurality of substrate-carriers is located in the load-lock chamber. An injector arrangement (120) is provided for ejecting a substrate-carrier from the magazine, transporting the substrate-carrier through the high vacuum valve, and inserting the substrate-carrier into a transport-station of the substrate-carrier.
REFERENCES:
patent: 3856654 (1974-12-01), George
C. H. George, J. Vac. Sci. Technol., vol. 10, No. 2, Mar./Apr. 1973, pp. 393-397.
Austin R. Russel
Photran Corporation
Weisstuch Aaron
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