Lithography systems and processes

Details Lithography systems and processes Lithography systems and processes

2006-06-05

2011-12-06

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S067000, C355S077000, C359S814000

Reexamination Certificate

active

08072577

ABSTRACT:
An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive layer; and providing a mask capable of defining at least one pattern that is to be transferred to the photo-sensitive layer. Specifically, the substrate has a top surface on or over the photo-sensitive layer, and the mask receives an electromagnetic wave from the light source at a first surface of the mask and generates a plurality of electromagnetic components from a second surface of the mask. The lithography process may also include: providing a lens, which provides a flat surface at a bottom surface of the lens, for transferring the pattern to the photo-sensitive layer; and adjusting the distance between the flat surface of the lens and the top surface of the substrate to control the number and amount of the electro-magnetic components projected onto the photo-sensitive layer.

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