Lithography system, exposure apparatus and their control...

Details Lithography system, exposure apparatus and their control... Lithography system, exposure apparatus and their control...

2005-05-24

2005-05-24

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

With measuring or testing

C438S015000

Reexamination Certificate

active

06897076

ABSTRACT:
A lithography system includes a pre-process apparatus which performs a pre-process for a substrate and an exposure apparatus which exposes the substrate pre-processed by the pre-process apparatus to a pattern. The pre-process apparatus includes a first control unit which transmits an instruction for starting exposure preparation to the exposure apparatus, and the exposure apparatus includes a second control unit which causes exposure preparation to start in accordance with the instruction transmitted from the pre-process apparatus.

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