Lithography system comprising a converter plate and means...

Details Lithography system comprising a converter plate and means... Lithography system comprising a converter plate and means...

2005-01-18

2005-01-18

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200

Reexamination Certificate

active

06844560

ABSTRACT:
A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).

REFERENCES:
patent: 4695732 (1987-09-01), Ward
patent: 4902930 (1990-02-01), Van Der Mast
patent: 6538256 (2003-03-01), Mankos et al.
patent: 0334334 (1989-09-01), None
patent: 0605964 (1994-07-01), None

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