Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-01-18
2005-01-18
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200
Reexamination Certificate
active
06844560
ABSTRACT:
A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).
REFERENCES:
patent: 4695732 (1987-09-01), Ward
patent: 4902930 (1990-02-01), Van Der Mast
patent: 6538256 (2003-03-01), Mankos et al.
patent: 0334334 (1989-09-01), None
patent: 0605964 (1994-07-01), None
Kampherbeek Bert Jan
Kruit Pieter
Wieland Marco
Blakely & Sokoloff, Taylor & Zafman
Mapper Lithography IP B.V.
Nguyen Kiet T.
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