Lithography system

Details Lithography system Lithography system

2005-10-25

2005-10-25

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S077000

Reexamination Certificate

active

06958804

ABSTRACT:
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

REFERENCES:
patent: 6251550 (2001-06-01), Ishikawa
patent: 6312134 (2001-11-01), Jain et al.
patent: 6379867 (2002-04-01), Mei et al.
patent: 2004/0124372 (2004-07-01), Gil et al.

Affiliated with

Also associated with

Rating

Lithography system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithography system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3436420