Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2010-03-02
2011-11-08
Spector, David N (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
C355S053000, C430S270100
Reexamination Certificate
active
08054557
ABSTRACT:
Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.
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Office Action for corresponding Taiwanese Appl No. 95120841, dated Sep. 14, 2010, with English summary.
Taiwanese Office Action, with English translation, for corresponding TW Appl No. 099113576, dated Feb. 18, 2011.
Blahnik Vladan
Kraehmer Daniel
Loering Ulrich
Ulrich Wilhelm
Wabra Norbert
Carl Zeiss SMT GmbH
Fish & Richardson P.C.
Spector David N
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