Lithography method and system with correction of overlay...

Details Lithography method and system with correction of overlay... Lithography method and system with correction of overlay...

2007-02-27

2007-02-27

Rapp, Chad (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000

Reexamination Certificate

active

11131356

ABSTRACT:
A method of controlling lithographic overlay offsets in the manufacture of semiconductor devices from wafers, comprising the steps of forming a lithographic pattern on a wafer layer with a lithographic tool, processing the wafer after the pattern is formed to enable fabrication of a semiconductor device, predicting overlay offset corrections based on one or more factors involved in the processing of the wafer, and utilizing the predicted overlay offset corrections to positionally control the lithographic tool.

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