Lithography mask utilizing asymmetric light source

Details Lithography mask utilizing asymmetric light source Lithography mask utilizing asymmetric light source

2007-10-02

2007-10-02

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Using reflected radiation, e.g., reflex copying, etc.

C430S311000, C430S322000

Reexamination Certificate

active

10791259

ABSTRACT:
A method of reflective lithography includes directing an asymmetric radiation (light) beam onto a reticle of a reflective lithography system. The asymmetry in the shape of the radiation beam may be used to compensate for a non-zero (non-normal) angle of incidence of the incident radiation. The radiation source shape may be configured to produce a substantially-symmetric output from the reticle. The shape of the radiation source may be configurable by any of a variety of suitable methods, for example by use of a configurable reflective device such as a fly's eye mirror, or by use of one or more suitable mirrors, lenses, and/or slits.

REFERENCES:
patent: 5989776 (1999-11-01), Felter et al.
patent: 6195201 (2001-02-01), Koch et al.
patent: 6731380 (2004-05-01), Amara et al.
patent: 2002/0085276 (2002-07-01), Tanitsu et al.
patent: 2004/0012775 (2004-01-01), Kinney et al.
patent: 2005/0225752 (2005-10-01), Takai et al.

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