Lithography mask, rewritable mask, process for manufacturing...

Details Lithography mask, rewritable mask, process for manufacturing... Lithography mask, rewritable mask, process for manufacturing...

2011-06-21

2011-06-21

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C430S005000

Reexamination Certificate

active

07965375

ABSTRACT:
Lithography mask or rewritable mask comprising at least one material with reversible changeable optical properties. Processes for manufacturing a mask, devices for processing a substrate, lithographic systems and semiconductor devices.

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patent: 2007/0152253 (2007-07-01), Lee et al.
patent: 2007/0242252 (2007-10-01), Tinnemans
Otto, T., “Local-scale optical properties of single-crystal ferroelectrics,” Dissertation, 2006, pp. 1-120, Technische Universität Dresden, Germany.

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