Lithography line width monitor reflecting chip-wide average...

Details Lithography line width monitor reflecting chip-wide average... Lithography line width monitor reflecting chip-wide average...

2006-03-21

2006-03-21

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Dimension

Width or diameter

Reexamination Certificate

active

07016054

ABSTRACT:
The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.

REFERENCES:
patent: 4963924 (1990-10-01), Gill et al.
patent: 6215127 (2001-04-01), Yu
patent: 6742168 (2004-05-01), Nariman

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