Lithography information control system

Details Lithography information control system Lithography information control system

1992-03-31

1993-09-07

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 46, 355204, 355208, G03B 2742

Patent

active

052433773

ABSTRACT:
A lithography system comprises an information gathering apparatus for gathering specific information set in each of plural exposure apparatus and variable according to operating conditions of each of the plural exposure apparatus in response to masks to be used in each of the plural exposure apparatus and substrates supplied thereto, or information obtained by measuring or evaluating the process state of a substrate processed by each of the plural exposure apparatus, independently from the control by a process control apparatus for controlling supply of the masks, supply of plural substrates to be exposed in each of the plural exposure apparatus, and operating conditions of each of the plural exposure apparatus in response to the masks and substrates supplied thereto. The lithography system further comprises a system observer apparatus capable of modifying or correcting a part of working paremeters set in each of the exposure apparatus, based on the gathered information, in such a manner that the operating conditions set by the process control apparatus can be stably maintained, independently from the control of the process control apparatus.

REFERENCES:
patent: 4314334 (1982-02-01), Daughton et al.
patent: 4676649 (1987-06-01), Phillips
patent: 4757355 (1988-07-01), Iizuka et al.
patent: 4780617 (1988-03-01), Umatate et al.
patent: 4908656 (1990-09-01), Suwa et al.
Van Den Brink, M. A. et al., "Matching Management of Multiple Wafer Steppers Using A Stable Standard and A Matching Simulator", Proceedings of SPIE, vol. 1087, (1989), pp. 218-232.

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