Lithography exposure device

Details Lithography exposure device Lithography exposure device

2005-02-22

2005-02-22

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S053000, C355S067000

Reexamination Certificate

active

06859261

ABSTRACT:
A lithography exposure device for producing exposed structures in a layer sensitive to light includes an exposure unit with a movement unit for the relative movement between the optical focusing element and a mounting device. A controler is provided for controlling intensity and position of the exposure spots, such that a plurality of conversion areas can be produced in the light-sensitive layer via the exposure spots. A controllable deflection device is provided between the laser radiation sources and the optical focusing means for the movement of the exposure spot in the deflection direction.

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