Lithography exposure device

Details Lithography exposure device Lithography exposure device

1998-03-26

1999-12-14

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 70, G03B 2742

Patent

active

060024666

ABSTRACT:
A lithography exposure device allows more effective production of small structures within a short time by lithography. The device includes a retainer for a substrate, an exposure unit for producing a light spot on the light-sensitive layer of the substrate, a motion unit for producing apparent motion between the exposure unit and the retainer, and a control unit for controlling the intensity and position of the light spot on the light-sensitive layer. The exposure unit has several solid-state lasers, and a focusing unit that guides the laser beam of each solid-state laser to a light spot of a defined light spot pattern. The entire light spot pattern and the retainer are displaceable relative to each other in an exposure motional direction. Moreover, the light spots of the light spot pattern which correspond to the form of the partial areas to be exposed can be activated or deactivated.

REFERENCES:
patent: 4393387 (1983-07-01), Kitamura
patent: 4541712 (1985-09-01), Whitney
patent: 4577926 (1986-03-01), Dewey et al.
patent: 4947186 (1990-08-01), Calloway et al.
patent: 5091744 (1992-02-01), Omata
patent: 5121256 (1992-06-01), Corle et al.
patent: 5339737 (1994-08-01), Lewis et al.
patent: 5343271 (1994-08-01), Morishige

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