Lithography device for semiconductor circuit pattern generator

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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C250S492220, C378S122000

Reexamination Certificate

active

10385386

ABSTRACT:
General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor layer of the membrane. The semiconductor membrane layer is initially formed from a substrate of standard thickness, and all but a thin surface layer of the substrate is then etched or polished away. In another version, the flexible membrane is used as support and electrical interconnect for conventional integrated circuit die bonded thereto, with the interconnect formed in multiple layers in the membrane. Multiple die can be connected to one such membrane, which is then packaged as a multi-chip module. Other applications are based on (circuit) membrane processing for bipolar and MOSFET transistor fabrication, low impedance conductor interconnecting fabrication, flat panel displays, maskless (direct write) lithography, and 3D IC fabrication.

REFERENCES:
patent: 2915722 (1959-12-01), Foster
patent: 3202948 (1965-08-01), Farrand
patent: 3559282 (1971-02-01), Lesk
patent: 3560364 (1971-02-01), Burkhardt
patent: 3602982 (1971-09-01), Emmasingel
patent: 3615901 (1971-10-01), Medicus
patent: 3716429 (1973-02-01), Napoli et al.
patent: 3777227 (1973-12-01), Krishna et al.
patent: 3868565 (1975-02-01), Kuipers
patent: 3922705 (1975-11-01), Yerman
patent: 3932932 (1976-01-01), Goodman
patent: 3997381 (1976-12-01), Wanlass
patent: 4028547 (1977-06-01), Eisenberger
patent: 4070230 (1978-01-01), Stein
patent: 4131985 (1979-01-01), Greenwood et al.
patent: 4142004 (1979-02-01), Hauser, Jr. et al.
patent: 4251909 (1981-02-01), Hoeberechts
patent: 4262631 (1981-04-01), Kubacki
patent: 4393127 (1983-07-01), Greschner et al.
patent: 4394401 (1983-07-01), Shioya et al.
patent: 4401986 (1983-08-01), Trenkler et al.
patent: 4416054 (1983-11-01), Thomas et al.
patent: 4500905 (1985-02-01), Shibata
patent: 4528072 (1985-07-01), Kurosawa et al.
patent: 4539068 (1985-09-01), Takagi et al.
patent: 4585991 (1986-04-01), Reid et al.
patent: 4604162 (1986-08-01), Sobczak
patent: 4612083 (1986-09-01), Yasumoto et al.
patent: 4617160 (1986-10-01), Belanger et al.
patent: 4618397 (1986-10-01), Shimizu et al.
patent: 4618763 (1986-10-01), Schmitz
patent: 4663559 (1987-05-01), Christensen
patent: 4684436 (1987-08-01), Burns et al.
patent: 4693770 (1987-09-01), Hatada
patent: 4702936 (1987-10-01), Maeda et al.
patent: 4706166 (1987-11-01), Go
patent: 4721938 (1988-01-01), Stevenson
patent: 4724328 (1988-02-01), Lischke
patent: 4761681 (1988-08-01), Reid
patent: 4784721 (1988-11-01), Holmen et al.
patent: 4810673 (1989-03-01), Freeman
patent: 4810889 (1989-03-01), Yokomatsu et al.
patent: 4825277 (1989-04-01), Mattox et al.
patent: 4835765 (1989-05-01), Bergmans et al.
patent: 4849857 (1989-07-01), Butt et al.
patent: 4857481 (1989-08-01), Tam et al.
patent: 4892753 (1990-01-01), Wang et al.
patent: 4897708 (1990-01-01), Clements
patent: 4919749 (1990-04-01), Mauger et al.
patent: 4924589 (1990-05-01), Leedy
patent: 4928058 (1990-05-01), Williamson
patent: 4934799 (1990-06-01), Chu
patent: 4939568 (1990-07-01), Kato et al.
patent: 4940916 (1990-07-01), Borel et al.
patent: 4950987 (1990-08-01), Vranish et al.
patent: 4952446 (1990-08-01), Lee et al.
patent: 4954865 (1990-09-01), Rokos
patent: 4957882 (1990-09-01), Shinomiya
patent: 4965415 (1990-10-01), Young et al.
patent: 4966663 (1990-10-01), Mauger
patent: 4983251 (1991-01-01), Haisma et al.
patent: 4990462 (1991-02-01), Sliwa
patent: 4994336 (1991-02-01), Benecke et al.
patent: 4994735 (1991-02-01), Leedy
patent: 5000113 (1991-03-01), Wang et al.
patent: 5008619 (1991-04-01), Keogh et al.
patent: 5010024 (1991-04-01), Allen et al.
patent: 5020219 (1991-06-01), Leedy
patent: 5034685 (1991-07-01), Leedy
patent: 5051326 (1991-09-01), Celler et al.
patent: 5062689 (1991-11-01), Koehler
patent: 5070026 (1991-12-01), Greenwald et al.
patent: 5071510 (1991-12-01), Findler et al.
patent: 5098865 (1992-03-01), Machado et al.
patent: 5103557 (1992-04-01), Leedy
patent: 5110373 (1992-05-01), Mauger
patent: 5110712 (1992-05-01), Kessler et al.
patent: 5111278 (1992-05-01), Eichelberger
patent: 5116777 (1992-05-01), Chan et al.
patent: 5119164 (1992-06-01), Sliwa et al.
patent: 5130894 (1992-07-01), Miller
patent: 5132244 (1992-07-01), Roy
patent: 5144142 (1992-09-01), Fueki et al.
patent: 5151775 (1992-09-01), Hadwin
patent: 5156909 (1992-10-01), Henager, Jr. et al.
patent: 5166962 (1992-11-01), Murooka et al.
patent: 5169805 (1992-12-01), Mok et al.
patent: 5188706 (1993-02-01), Hori et al.
patent: 5203731 (1993-04-01), Zimmerman
patent: 5225771 (1993-07-01), Leedy
patent: 5236118 (1993-08-01), Bower et al.
patent: 5240458 (1993-08-01), Linglain et al.
patent: 5259247 (1993-11-01), Bantien
patent: 5262341 (1993-11-01), Fueki et al.
patent: 5262351 (1993-11-01), Bureau et al.
patent: 5270261 (1993-12-01), Bertin et al.
patent: 5273940 (1993-12-01), Sanders
patent: 5274270 (1993-12-01), Tuckerman
patent: 5279865 (1994-01-01), Chebi et al.
patent: 5284796 (1994-02-01), Nakanishi et al.
patent: 5284804 (1994-02-01), Moslehi
patent: 5323035 (1994-06-01), Leedy
patent: 5324687 (1994-06-01), Wojnarowski
patent: 5354695 (1994-10-01), Leedy
patent: 5358909 (1994-10-01), Hashiguchi et al.
patent: 5363021 (1994-11-01), MacDonald
patent: 5385632 (1995-01-01), Goossen
patent: 5385909 (1995-01-01), Nelson et al.
patent: RE34893 (1995-04-01), Fujii et al.
patent: 5420458 (1995-05-01), Shimoji
patent: 5424920 (1995-06-01), Miyake
patent: 5426072 (1995-06-01), Finnila
patent: 5426363 (1995-06-01), Akagi et al.
patent: 5432444 (1995-07-01), Yasohama et al.
patent: 5432729 (1995-07-01), Carson et al.
patent: 5432999 (1995-07-01), Capps et al.
patent: 5434500 (1995-07-01), Hauck et al.
patent: 5451489 (1995-09-01), Leedy
patent: 5453404 (1995-09-01), Leedy
patent: 5457879 (1995-10-01), Gurtler et al.
patent: 5470693 (1995-11-01), Sachdev et al.
patent: 5476813 (1995-12-01), Naruse
patent: 5480842 (1996-01-01), Clifton et al.
patent: 5489554 (1996-02-01), Gates
patent: 5502667 (1996-03-01), Bertin et al.
patent: 5512397 (1996-04-01), Leedy
patent: 5514628 (1996-05-01), Enomoto et al.
patent: 5527645 (1996-06-01), Pati et al.
patent: 5529829 (1996-06-01), Koskenmaki et al.
patent: 5534465 (1996-07-01), Frye et al.
patent: 5555212 (1996-09-01), Toshiaki et al.
patent: 5563084 (1996-10-01), Ramm et al.
patent: 4940916 (1996-11-01), Borel et al.
patent: 5571741 (1996-11-01), Leedy
patent: 5577050 (1996-11-01), Bair et al.
patent: 5580687 (1996-12-01), Leedy
patent: 5581498 (1996-12-01), Ludwig et al.
patent: 5582939 (1996-12-01), Pierrat
patent: 5583688 (1996-12-01), Hornbeck
patent: 5592007 (1997-01-01), Leedy
patent: 5592018 (1997-01-01), Leedy
patent: 5595933 (1997-01-01), Heijboer
patent: 5606186 (1997-02-01), Noda
patent: 5620915 (1997-04-01), Chen et al.
patent: 5627112 (1997-05-01), Tennant et al.
patent: 5629137 (1997-05-01), Leedy
patent: 5633209 (1997-05-01), Leedy
patent: 5637536 (1997-06-01), Val
patent: 5637907 (1997-06-01), Leedy
patent: 5654127 (1997-08-01), Leedy
patent: 5654220 (1997-08-01), Leedy
patent: 5656552 (1997-08-01), Hudak et al.
patent: 5675185 (1997-10-01), Chen et al.
patent: 5694588 (1997-12-01), Ohara et al.
patent: 5725995 (1998-03-01), Leedy
patent: 5733814 (1998-03-01), Flesher et al.
patent: 5745673 (1998-04-01), Di Zenzo et al.
patent: 5750211 (1998-05-01), Weise et al.
patent: 5760478 (1998-06-01), Bozso et al.
patent: 5773152 (1998-06-01), Okonogi
patent: 5786116 (1998-07-01), Rolfson
patent: 5793115 (1998-08-01), Zavracky et al.
patent: 5818748 (1998-10-01), Bertin et al.
patent: 5831280 (1998-11-01), Ray
patent: 5834334 (1998-11-01), Leedy
patent: 5840593 (1998-11-01), Leedy
patent: 5856695 (1999-01-01), Ito et al.
patent: 5868949 (1999-02-01), Sotokawa et al.
patent: 5869354 (1999-02-01), Leedy
patent: 5870176 (1999-02-01), Sweatt et al.
patent: 5880010 (1999-03-01), Davidson
patent: 5882532 (1999-03-01), Field et al.
patent: 5902118 (1999-05-01), Hübner
patent: 5915167 (1999-06-01),

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