Lithography-based patterning of layer-by-layer...

Details Lithography-based patterning of layer-by-layer... Lithography-based patterning of layer-by-layer...

2006-08-15

2006-08-15

Alanko, Anita (Department: 1765)

Etching a substrate: processes

Forming pattern using lift off technique

C216S041000, C216S047000, C216S049000, C427S256000, C427S259000, C427S404000, C428S195100, C428S209000, C430S311000, C430S312000, C430S313000

Reexamination Certificate

active

07090783

ABSTRACT:
A method of patterning self-assembled thin films, including forming a photoresist layer on a substrate and then patterning and etching the photoresist layer. In combination with the etched photoresist layer, a self-assembled layer is formed on the substrate using LbL self-assembly.

REFERENCES:
patent: 5208111 (1993-05-01), Decher et al.
patent: 5539573 (1996-07-01), Schalz et al.
patent: 5686549 (1997-11-01), Grainger et al.
patent: 5688642 (1997-11-01), Chrisey et al.
patent: 5727977 (1998-03-01), Maracas et al.
patent: 5885753 (1999-03-01), Crooks et al.
patent: 6020175 (2000-02-01), Onda et al.
patent: 6022590 (2000-02-01), Ferguson et al.
patent: 6114099 (2000-09-01), Liu et al.
patent: 6479146 (2002-11-01), Caruso et al.
patent: 6586158 (2003-07-01), Dobisz et al.
patent: 2003/0152703 (2003-08-01), Hammond et al.
patent: 2005/0001317 (2005-01-01), Ganapathiraman et al.
G. Decher;Fuzzy Nanoassemblies: Toward Layered Polymeric Multicomposites; Aug. 29, 1997; pp. 1230-1236;Science Magazine, vol. 277.
H. Zheng, I. Lee, M. Rubner & P. Hammond;Two Component Particle Arrays on Patterned Polyelectrolyte Multilayer Templates; Jan. 25, 2002;Advanced Materials HEFT 8.
X. Juang, H. Zheng, S. Gourdin & P. Hammond;Polymer-on-Polymer Stamping: Universal Approaches to Chemically Patterned Surfaces; Jan. 10, 2002; pp. 2607-2615;Langmuir, vol. 18, No. 7.
K. Chen, X. Jiang, L. Kimerling & P. Hammond;Selective Self-Organization of Colloids on Patterned Polyelectrolyte Templates; Jun. 9, 2000; pp. 7825-7834;Langmuir, vol. 16, No. 20.
Y. Lvov, K. Ariga, M. Onda, I. Ichinose & T. Kunitake;Alternate Assembly of Ordered Multilayers of SiO2and Other Nanoparticles and Polyions; May 19, 1997; pp. 6195-6203;Langmuir, vol. 13, No. 23.
Y. Lvov, G. Decher & H. Mohwald;Assembly, Structural Characterization, and Thermal Behavior of Layer-by-Layer Deposited Ultrathin Films of Poly(vinyl sulfate)and Poly(allylamine); Jul. 27, 1992; pp. 481-486;Langmuir, vol. 9, No. 2.
T. Serizawa, S. Kamimura & M. Akashi;Electrostatic Adsorption of Polystyrene Particles with Difference Surface Charges onto the Surface of an Ultrathin Polymer Film; Aug. 10, 1999; pp. 237-245;Colloids and Surfaces A: Physicochemical&Engineering Aspects164.
X. Jiang & P. Hammond;Selective Deposition in Layer-by-Layer Assembly: Functional Graft Copolymers as Molecular Templates; Jul. 18, 2000; pp. 8501-8509;Langmuir, vol. 16, No. 22.

Affiliated with

Also associated with

Rating

Lithography-based patterning of layer-by-layer... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithography-based patterning of layer-by-layer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography-based patterning of layer-by-layer... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3614022