Lithography apparatus and method utilizing pendulum...

Details Lithography apparatus and method utilizing pendulum... Lithography apparatus and method utilizing pendulum...

2006-10-12

2008-12-16

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07466396

ABSTRACT:
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

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patent: 6144442 (2000-11-01), 'T Mannetje et al.
patent: 6246204 (2001-06-01), Ebihara et al.
patent: 6323935 (2001-11-01), Ebihara et al.
patent: 6337484 (2002-01-01), Loopstra et al.
patent: 6473161 (2002-10-01), Cuijpers et al.
patent: 2004/0000215 (2004-01-01), Phillips et al.
patent: A-60-78125 (1985-05-01), None
patent: WO 2006/038952 (2006-04-01), None

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